表面處理R2R壓印製程應用-1
中英文摘要 R2R壓印技術具有大量生產,成本低的優勢,被認為是軟性顯示器及軟性電子最具競爭力的微奈米結構圖案技術;如何控制軟性基材-光阻-模板之相互作用力為壓印製程成敗的關鍵。本文介紹表面處理技術於R2R紫外光壓印製程之應用,包含模板的抗沾粘處理,如自我排列單分子薄膜(SAM)、類鑽石薄膜(DLC)及含氟類鑽石薄膜(F-DLC),及大氣電漿對軟性基材表面處理的重要性。最後以抗眩膜為例,在模板上披覆DLC進行脫模測試,結果大幅改善模板對光阻的脫模性。 Because the low cost and mass production ability, R2R imprint process can be used to flexible electronics and flexible display manufacture in micro or nano structure formation. The interfacial force control between flexible substrates, UV resists and templates is the key points which we need to carefully consider. In this paper, we introduce some surface treatment methods apply to R2R UV imprint process. One is the template anti-sticking treatments, including self assembly monolayer (SAM), diamond like carbon films (DLC), fluorine-doped, or fluorinated diamond like carbon films (F-DLC). The other is surface treatment of flexible substrate using atmospheric pressure plasma. 前言 軟性顯示器由於具備輕、薄、可捲曲等方便性,漸漸成為人類所追逐次一世代顯示器。由於軟性顯示器使用塑膠膜材(PET)做為基材,必需剪裁成一片一片貼在玻璃基板上,才能與玻璃面板一樣...